Dione-CIS is an advanced Automated Optical Inspection (AOI) system designed for high-speed and high-accuracy inspection of pattern defects and particles on semiconductor photomasks. It supports both die-to-die and die-to-database inspection, ensuring reliable defect detection for critical mask layers.
By combining high-resolution imaging, efficient data processing, and simultaneous transmission and reflection inspection, Dione-CIS delivers excellent inspection performance with low operational cost.
Dione-CIS provides fast and precise inspection across a wide range of photomask sizes. Its dedicated database engine enables handling of high-density inspection data, while its optimized optical design ensures accurate detection of both pattern defects and particles.
The system is suitable for production environments requiring high throughput, stable performance, and cost efficiency.
Ideal for:
Semiconductor photomask inspection
Advanced logic and memory device masks
Particle and pattern defect monitoring
High-volume manufacturing inspection
R&D and process development environments
Specification | Typical Value |
Imprint Modes | Thermal (up to 250 °C) / UV (365 nm or 405 nm) |
Substrate Size | Up to Ø120 mm or Ø210 mm |
Minimum Feature Size | ~100 nm |
Supported Materials | Thermoplastics, UV resists, glass, silicon, polymers |
Operation | Manual or semi-automated |
System Size | Compact desktop configuration |
Configuration Options | 20+ variants for chamber, UV source, and control interface |
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