HTL Co. India Pvt. Ltd.

Semiconductor & Equipment Solutions

Precision registration measuring tool

Precision registration measuring tool PMARS-CRGS

Precision registration measuring tool that accurately measures pattern positions on semiconductor photomasks

PMARS-CRGS is a high-precision registration measuring system designed to accurately measure pattern positions on semiconductor photomasks. Built for stability, repeatability, and environmental control, it ensures reliable registration measurement for advanced semiconductor manufacturing.

By combining a high-rigidity microscope system with automated mask handling, PMARS-CRGS delivers drift-free, highly repeatable measurement performance across a wide range of photomask sizes.

Product Specifications

Product Overview

PMARS-CRGS provides precise registration measurement by minimizing mechanical drift and environmental influence. Its robust optical design and robotic handling system create a stable measurement environment, enabling consistent results even in demanding production and R&D settings.

The system supports flexible photomask sizes and is optimized for accurate alignment verification and process control.

Key Features

  • Achieved drift free and high repeatability measurement to apply high rigidity microscope system.
  • Robotic mask handling minimizes environmental fluctuations inside the chamber.
  • Available measurement from 5 inch to 9 inch by changing the mask frame (mask holder)

Applications

  • Semiconductor photomask registration inspection

  • Advanced logic and memory device masks

  • Alignment accuracy verification

  • Process monitoring and yield improvement

  • R&D and metrology laboratories

Benefits to Your Workflow

  • High accuracy: Precise pattern position measurement

  • Excellent repeatability: Drift-free optical system

  • Stable environment: Reduced influence of environmental changes

  • Flexible operation: Supports multiple photomask sizes

  • Automation-ready: Robotic handling reduces operator dependency

Catalog

Technical Overview

Specification

Typical Value

Imprint Modes

Thermal (up to 250 °C) / UV (365 nm or 405 nm)

Substrate Size

Up to Ø120 mm or Ø210 mm

Minimum Feature Size

~100 nm

Supported Materials

Thermoplastics, UV resists, glass, silicon, polymers

Operation

Manual or semi-automated

System Size

Compact desktop configuration

Configuration Options

20+ variants for chamber, UV source, and control interface

Contact us to

Request a demo or sample imprint

Discuss your application needs

Get configuration and pricing details

HTL Co. India Pvt. Ltd.

Semiconductor & Equipment Solutions

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