Precision registration measuring tool that accurately measures pattern positions on semiconductor photomasks
PMARS-CRGS is a high-precision registration measuring system designed to accurately measure pattern positions on semiconductor photomasks. Built for stability, repeatability, and environmental control, it ensures reliable registration measurement for advanced semiconductor manufacturing.
By combining a high-rigidity microscope system with automated mask handling, PMARS-CRGS delivers drift-free, highly repeatable measurement performance across a wide range of photomask sizes.
PMARS-CRGS provides precise registration measurement by minimizing mechanical drift and environmental influence. Its robust optical design and robotic handling system create a stable measurement environment, enabling consistent results even in demanding production and R&D settings.
The system supports flexible photomask sizes and is optimized for accurate alignment verification and process control.
Semiconductor photomask registration inspection
Advanced logic and memory device masks
Alignment accuracy verification
Process monitoring and yield improvement
R&D and metrology laboratories
High accuracy: Precise pattern position measurement
Excellent repeatability: Drift-free optical system
Stable environment: Reduced influence of environmental changes
Flexible operation: Supports multiple photomask sizes
Automation-ready: Robotic handling reduces operator dependency
Specification | Typical Value |
Imprint Modes | Thermal (up to 250 °C) / UV (365 nm or 405 nm) |
Substrate Size | Up to Ø120 mm or Ø210 mm |
Minimum Feature Size | ~100 nm |
Supported Materials | Thermoplastics, UV resists, glass, silicon, polymers |
Operation | Manual or semi-automated |
System Size | Compact desktop configuration |
Configuration Options | 20+ variants for chamber, UV source, and control interface |
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