SPS POLOS SPIN COATERS

Advanced Spin Coating Systems for Semiconductor, MEMS & Thin-Film Processing

The SPS POLOS Spin Coater Series is a comprehensive range of high-performance spin processing systems designed for photoresist coating, thin-film deposition, developing, cleaning, rinse/dry processing, and surface treatment applications.

Available in laboratory, pilot production, and fully automated configurations, POLOS spin coaters support substrates from small samples up to 500 mm wafers and large-format panels. Built with chemically resistant NPP or PTFE process chambers, these systems deliver excellent coating uniformity, repeatable process control, and reliable cleanroom operation.

The platform is widely used in semiconductor manufacturing, MEMS fabrication, microfluidics, nanotechnology, photonics, life sciences, photovoltaics, and advanced materials research.

Product Specifications

Key Features

Precision Thin-Film Processing

Advanced brushless motor technology ensures highly uniform coating, developing, cleaning, and drying performance.

Capabilities

Spin speeds up to 12,000 RPM
Programmable acceleration profiles
CW, CCW, and puddle processing modes
Excellent process repeatability

Chemically Resistant Design

Available in Natural Polypropylene (NPP) and PTFE configurations for compatibility with aggressive chemicals and cleanroom environments.

Benefits

Corrosion-resistant construction
Reduced contamination risk
Easy maintenance
Long operational life

Advanced Recipe Programming

Touchscreen control enables flexible multi-step process management and recipe storage.

Features

Programmable process recipes
User-friendly touchscreen interface
Step-by-step parameter control
Process repeatability across batches

Automation-Ready Architecture

Selected models support robotic wafer handling, automated dispensing, nitrogen diffuser control, and wet bench integration.

Scalable Platform

From compact research systems to fully automated production tools, the POLOS range supports evolving process and throughput requirements.

Applications

Semiconductor & MEMS Fabrication

Uniform photoresist coating and thin-film processing for wafer-level manufacturing and microfabrication.

Microfluidics & Life Sciences

Precise coating of biochips, lab-on-chip devices, and biomedical research substrates.

Nanotechnology & Advanced Materials

Supports thin-film deposition, nanomaterial processing, and surface engineering applications.

Photonics & Optoelectronics

Reliable coating processes for optical devices, sensors, and photonic structures.

Research, Pilot Production & Manufacturing

Scalable solutions for universities, R&D laboratories, cleanrooms, pilot lines, and industrial production facilities.

Key Benefits

Supports 4″, 8″, and 12″ wafer formats
High cutting accuracy and repeatability
Adjustable pressure control for consistent results
Diamond and carbide wheel compatibility
Excellent edge quality with reduced chipping
Compact, ergonomic, and cleanroom-friendly design
Suitable for Silicon, Sapphire, SiC, Quartz, and Glass substrates
Cost-effective alternative to large wafer dicing systems

Catalog

Product Range

Model	Max Substrate Size	Typical Application	Key Feature
SPIN150x	150 mm / 4″ × 4″	Laboratory R&D	Compact desktop system
SPIN200x	200 mm / 6″ × 6″	Semiconductor Research	Automated dispense compatibility
SPIN300x	300 mm / 8″ × 8″	Pilot Production	Advanced I/O and automation options
POLOS® 450 Advanced	460 mm / 10″ × 10″	Large-Area Processing	Extended programmable control
POLOS® SPIN4000A	300 mm / 8″ × 8″	Automated Manufacturing	Industrial-grade automation
POLOS® SPIN5000A	500 mm / 10″ × 10″	High-Volume Production	Fully automated PLC/HMI platform

Common Specifications

Specification	Description
Maximum Speed	Up to 12,000 RPM
Rotation Modes	CW, CCW & Puddle Mode
Chamber Materials	NPP or PTFE
Control Interface	Touchscreen Programming
Integration Options	Tabletop, In-Deck & Automated Systems
Process Functions	Coating, Developing, Cleaning, Rinse/Dry, Etching

Why Choose SPS POLOS Spin Coaters?

Substrate support up to 500 mm
High coating uniformity and repeatability
NPP and PTFE chemical-resistant construction
Programmable touchscreen recipe control
Automation and robotic handling compatibility
Suitable for R&D, pilot production, and manufacturing
Proven platform for semiconductor and MEMS applications

Contact us to

Request technical specifications
Discuss substrate and process requirements
Explore automation and wet bench integration
Schedule a product demonstration

HTL Co. India Pvt. Ltd.

Semiconductor & Equipment Solutions