Neoark Corporation

Neoark Corporation PALET – DDB-701 Series

Compact, precise, and effortless mask-less lithography.

A new way to create micro-patterns

The PALET DDB-701 Series from NEOARK redefines lithography for research and prototyping environments. Designed as a desktop-sized mask-less lithography system, it brings high-precision patterning capabilities to your lab or workspace; without the complexity and cost of traditional photomask processes.

With PALET, you can go from design to exposure in minutes, turning concepts into physical microstructures quickly, flexibly, and affordably.

Product Specifications

Key Features

Compact desktop footprint
PALET fits easily on a benchtop, requiring minimal space and no special cleanroom infrastructure. It’s ideal for universities, R&D labs, and innovation centers where agility and flexibility matter.
Mask-less exposure made simple
Skip the mask fabrication process entirely. Import your design file, set parameters, and start exposure all within an intuitive software interface.
Built-in vibration isolation
The system’s internal vibration-control structure ensures stable patterning results without the need for a separate anti-vibration table or external air supply.
User-friendly software
Designed for ease of use, PALET’s control software allows seamless import of common file types like DXF, JPEG, PNG, and bitmap images. Automatic alignment and preview functions make operation straightforward even for new users.
Precision patterning
- With a ×10 objective lens, achieve line widths around 3 µm.
- With a ×2 lens, line widths around 15 µm are typical.
- Auto-stitching allows exposure of larger areas up to 25 mm × 25 mm with consistent precision.
Versatile exposure capability
The system accommodates workpieces up to 60 mm × 60 mm and about 3 mm thick — suitable for a wide range of substrates, including photoresists on glass, silicon, or polymer films.

Applications

PALET is designed for engineers, researchers, and innovators who need a quick, precise, and space-saving lithography solution. Typical uses include:

MEMS and microfluidic device development
Optical and sensor prototyping
Semiconductor and thin-film R&D
Patterned electrodes or micro-circuits
Rapid iteration of design concepts without mask production
Educational and research training environments

Benefits to Your Workflow

Faster turnaround: Move from CAD design to exposed pattern in hours instead of days.
Design flexibility: Modify and test new patterns instantly without re-ordering masks.
Cost-effective operation: Eliminate mask costs and reduce maintenance requirements.
Compact and self-contained: Desktop system with integrated vibration isolation and vacuum suction.

Precision and repeatability: Stable optics and accurate stage control ensure consistent results, run after run.

Catalog

Technical Overview

Specification	Typical Value
Minimum Line Width	~3 µm (×10 lens), ~15 µm (×2 lens)
One-Shot Exposure Area	1 mm × 0.6 mm (×10 lens) / 5 mm × 3 mm (×2 lens)
Maximum Exposure Area	25 mm × 25 mm (auto-stitched)
Acceptable Work Size	Up to 60 mm × 60 mm, thickness approx. 3 mm
Light Source	UV LED (approx. 365 nm)
File Formats Supported	DXF, JPEG, PNG, BMP, XPS
System Dimensions	Approx. 300 mm (W) × 450 mm (D) × 450 mm (H)

Contact us to

Request a live demo or technical consultation

Get configuration and pricing details

Explore integration options for your process

HTL Co. India Pvt. Ltd.

Semiconductor & Equipment Solutions