HTL Co. India Pvt. Ltd.

Semiconductor & Equipment Solutions

NILT Nanoimprint Mold

High-Precision Masters for Nanoimprint Lithography Accurate.

Durable. Built for real manufacturing.
Turning nanoscale ideas into repeatable, reliable structures.

NILT Nanoimprint Masters (also known as molds or stamps) are engineered to deliver exceptional nanoscale pattern fidelity across a wide range of nanoimprint lithography processes. With years of experience in advanced lithography and nanofabrication, we create masters that combine ultra-fine pattern accuracy with long-term stability ideal for R&D, pilot production, or high-volume replication.

Product Specifications

Key Features

  • Advanced nanostructure fabrication
    Masters are created using high-end lithography and precision etching to achieve clear, sharp, and highly uniform nanoscale patterns.

  • Multiple master formats
    Choose between wafer-based masters or custom-shaped formats that integrate seamlessly into your imprinting setup or production tools.

  • Wide material selection
    Masters are available in materials such as silicon and quartz, selected for optical performance, durability, or etching depth based on your needs.

  • Fully custom patterning
    From micro-optics and meta-surfaces to diffractive gratings and complex 3D shapes, each master can be customized to match your design requirements.

  • High surface quality
    Every master undergoes careful processing and inspection to ensure low surface roughness, high pattern consistency, and repeatable imprint performance.

  • Seamless process support
    Beyond fabrication, NILT provides assistance with imprinting, replication, and scaling — ensuring the master performs exactly as intended.

Applications

NILT Nanoimprint Masters are ideal for:

  • Meta-optics and meta-lens fabrication

  • Diffractive optical elements and gratings

  • Micro-optical components and micro-lens arrays

  • MEMS and microfluidic device structures

  • Wafer-level optics and flat optical components

  • Roll-to-roll replication, embossing, injection molding, and other high-volume processes

  • Prototyping, design verification, and pilot production

Benefits to Your Workflow

  • Nanometer-level precision with stable, repeatable performance
  • Suitable for both research-level work and mass manufacturing
  • Long-lasting materials engineered for repeated imprint cycles
  • Freedom to design complex, multi-level, or 3D structures
  • Support across the entire NIL workflow — from design to replication
  • Faster development timelines thanks to consistent master quality

Catalog

Technical Overview

Specification

Typical Value

Fabrication Method

Electron-beam lithography, precision etching

Substrate Materials

Silicon, quartz

Maximum Master Size

Up to ~200 mm (or custom formats)

Minimum Feature Size

Tens of nanometers

Pattern Options

Meta-surfaces, gratings, microlenses, 3D structures, multi-level designs

Aspect Ratio

High-aspect-ratio structures supported

Optional Coatings

Anti-sticking or process-specific surface treatments

Production Scope

Suitable for prototyping through large-scale replication

Contact us to

Request a live demo or technical consultation

Discuss your lithography process or mask requirements

Get pricing, configuration options, or technical guidance

HTL Co. India Pvt. Ltd.

Semiconductor & Equipment Solutions

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