Arradiance’s advanced Atomic Layer Deposition (ALD) and Molecular Layer Deposition (MLD) systems deliver unmatched nanoscale control for research, development, and production. With compact benchtop tools and reconfigurable high-capacity platforms, Arradiance enables ultra-conformal coatings, precise film engineering, and consistent results across even the most complex 3D structures.
Whether developing novel materials, coating high-aspect-ratio substrates, or scaling nano-coating processes to production, Arradiance provides a powerful combination of precision, flexibility, and proven reliability.
Arradiance offers two major system families, each designed for different application scales and material challenges.
Compact, versatile, and ideal for universities, R&D labs, and early-stage material development.
High-capacity systems designed for complex materials, large substrates, and pilot-to-volume manufacturing.
Atomic-Level Film Precision
Self-limiting ALD/MLD chemistries ensure uniform, pinhole-free coatings with atomic-scale thickness control even on complex and high-aspect-ratio surfaces.
Modular, Scalable System Architecture
Choose from benchtop GEMStar™ XT reactors to PRIME™ platforms supporting up to 14 precursor sources for thermal ALD, PEALD, and MLD.
Material-Agnostic Thin-Film Capability
Depositions available for a wide range of oxides, nitrides, metals, hybrid organic-inorganic films, and polymeric MLD materials.
Heated & Low-Vapor-Pressure Precursor Handling
Multiple independently heated zones and Pulsed Vapor Push™ (PVP) technology ensure stable delivery of challenging precursors.
Plasma or Thermal Operation
Options for high-uniformity thermal ALD or energetic plasma-enhanced ALD with 300 W ICP sources for reactive chemistries.
Advanced Process Control
GEMFlow™ provides real-time process monitoring, recipe control, and safe handling of reactive gases using RGIP™ isolation.
Process wafers, powders, foams, porous media, and complex geometries with consistent, conformal coverage.
Arradiance deposition systems are ideal for:
Materials Supported
Specification | Value / Range |
Reactor Temperature | Up to ~300 °C (model dependent) |
Precursor Sources | 2–4 (GEMStar) / Up to 14 (PRIME) |
Plasma Source | 300 W ICP (PEALD models) |
Process Modes | Thermal ALD, PEALD, MLD, Exposure, Flow-Through |
Substrate Compatibility | Wafers up to 200 mm, M12 modules, powders, 3D structures |
Precursor Delivery | Heated zones, low-vapor-pressure compatible, PVP™ boost |
Gas Handling | Mass flow controlled, RGIP™ gas isolation |
Automation | GEMFlow™ monitoring & recipe software |
Platform Size | Benchtop to full production-scale PRIME systems |
Need coatings without purchasing equipment?
Arradiance’s Foundry provides professional ALD, PEALD, and MLD processing
Ideal for companies, research institutions, and product developers requiring precision nano-films without internal ALD/MLD capability.
Learn more about GEMStar and PRIME system options
Request a demo, sample coating, or technical consultation
Start a coating job or R&D collaboration
Discuss material development or custom nano-film engineering
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