The ESTION E-Reticle is an intelligent, instrumented photomask designed to measure electrostatic charge where it truly matters—directly on the mask surface, during real production handling. With built-in sensors, on-board logging, wireless connectivity, and seamless integration into automated environments, the E-Reticle delivers unprecedented visibility into static conditions that lead to mask damage, chrome deterioration, and reduced lifetime.
Whether you’re optimizing production tools, verifying cleanroom processes, or diagnosing handling-related risks, the E-Reticle provides a deeper, more accurate understanding of the electrostatic forces influencing your photomask fleet.
In-Situ Electrostatic Measurement
The E-Reticle continuously measures electrostatic potential differences at four distinct areas on the mask, providing real-world, real-time visibility of charge conditions during handling and processing
Real-Time Logging & Wireless Data Access
With its integrated clock, on-board memory, and WLAN capability, the E-Reticle records every event and allows simple wireless data retrieval for trend analysis and reporting.
SMIF-Compatible Docking Station
A fully SMIF-compatible docking station enables the E-Reticle to move through automated production flows just like a real photomask—capturing data at each stage without disrupting operations.
Portable Docking Station for R&D
A compact, portable docking station option supports engineering teams performing standalone testing, process validation, or tool-specific investigations.
Automated Process Monitoring
Designed for routine integration into production cycles, the E-Reticle helps manufacturers establish continuous monitoring programs that identify, quantify, and address electrostatic problems before they cause damage.
Photomask-Grade Construction
Created with materials, dimensions, and handling characteristics identical to a real mask, ensuring truly representative measurements.
The E-Reticle is ideal for:
Why It Matters
Electrostatic charge is one of the most persistent and costly risks in photomask manufacturing and handling. Because masks combine insulating quartz and conductive chrome, even small discharges can cause:
The E-Reticle reveals where and when these electrostatic risks occur, enabling engineers to:
It turns static electricity, often a “hidden factor” into a measurable, actionable parameter.
Specification | Value / Description |
Measurement Zones | Four independently measured surface areas |
Data Storage | Internal memory with real-time timestamping |
Connectivity | WLAN for data download and system communication |
Compatibility | Full SMIF handling compatibility |
Docking Options | Standard SMIF docking station or portable R&D version |
Usage Mode | Continuous production monitoring or engineering evaluation |
Design | Matches standard photomask geometry and handling requirements |
Request an E-Reticle demonstration
Learn how it can be integrated into your fab or mask shop
Start an electrostatic audit or process evaluation
Discuss custom measurement or tool-compatibility requirements
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