Venus is a high-precision critical dimension (CD) measuring system designed specifically for photomasks used in Flat Panel Display (FPD) manufacturing. It delivers stable, repeatable, and operator-independent measurement of pattern dimensions, ensuring consistent quality control for advanced display technologies.
With precision motion control, high-resolution imaging, and fully automated measurement, Venus provides reliable CD analysis even on large-format photomasks.
Venus enables accurate and repeatable measurement of photomask pattern dimensions, minimizing the influence of environmental vibration, mask deflection, and operator variability. Its advanced imaging and motion control technologies ensure clear visualization and precise measurement of critical features.
The system is optimized for both production environments and R&D applications requiring dependable CD metrology.
FPD photomask CD inspection
Display manufacturing quality control
Pattern verification for LCD, OLED, and Micro-LED panels
Process monitoring and yield improvement
Research and development laboratories
High accuracy: Reliable CD measurement of fine patterns
Excellent repeatability: Stable stage and precise feedback control
Operator-independent results: Fully automated measurement process
Clear visualization: High-resolution imaging for confident analysis
Large mask support: Compatible with photomasks up to G10
Specification | Typical Value |
Imprint Modes | Thermal (up to 250 °C) / UV (365 nm or 405 nm) |
Substrate Size | Up to Ø120 mm or Ø210 mm |
Minimum Feature Size | ~100 nm |
Supported Materials | Thermoplastics, UV resists, glass, silicon, polymers |
Operation | Manual or semi-automated |
System Size | Compact desktop configuration |
Configuration Options | 20+ variants for chamber, UV source, and control interface |
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