HTL Co. India Pvt. Ltd.

Semiconductor & Equipment Solutions

Venus(Critical dimension measuring tool)

Accurate CD Measurement for FPD Photomasks

Venus is a high-precision critical dimension (CD) measuring system designed specifically for photomasks used in Flat Panel Display (FPD) manufacturing. It delivers stable, repeatable, and operator-independent measurement of pattern dimensions, ensuring consistent quality control for advanced display technologies.

With precision motion control, high-resolution imaging, and fully automated measurement, Venus provides reliable CD analysis even on large-format photomasks.

Product Specifications

Product Overview

Venus enables accurate and repeatable measurement of photomask pattern dimensions, minimizing the influence of environmental vibration, mask deflection, and operator variability. Its advanced imaging and motion control technologies ensure clear visualization and precise measurement of critical features.

The system is optimized for both production environments and R&D applications requiring dependable CD metrology.

Specialty

  • High precision XY stage with long term stability and anti-vibration, and accurate feedback system with linear scales ensure good repeatability.
  • A high-resolution monochrome CCD camera (2 megapixels, 1/1.8 inch) and a high performance micro scope provide clear images.
  • Automatic measurement ensures stable and consistent results, unaffected by mask deflection or warping and free from operator error.

Manufacturer

  • V-TECHNOLOGY

Supported Photomask Size

  • Photomask Size:G10
  • Customization: Available based on application requirements

Applications

  • FPD photomask CD inspection

  • Display manufacturing quality control

  • Pattern verification for LCD, OLED, and Micro-LED panels

  • Process monitoring and yield improvement

  • Research and development laboratories

Benefits to Your Workflow

  • High accuracy: Reliable CD measurement of fine patterns

  • Excellent repeatability: Stable stage and precise feedback control

  • Operator-independent results: Fully automated measurement process

  • Clear visualization: High-resolution imaging for confident analysis

  • Large mask support: Compatible with photomasks up to G10

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Catalog

Technical Overview

Specification

Typical Value

Imprint Modes

Thermal (up to 250 °C) / UV (365 nm or 405 nm)

Substrate Size

Up to Ø120 mm or Ø210 mm

Minimum Feature Size

~100 nm

Supported Materials

Thermoplastics, UV resists, glass, silicon, polymers

Operation

Manual or semi-automated

System Size

Compact desktop configuration

Configuration Options

20+ variants for chamber, UV source, and control interface

Contact us to

Request a demo or sample imprint

Discuss your application needs

Get configuration and pricing details

HTL Co. India Pvt. Ltd.

Semiconductor & Equipment Solutions

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