V-Technology Mask Writers provide advanced photomask writing solutions for semiconductor and flat panel display manufacturing. Engineered for precision, throughput, and operational stability, these systems support a wide range of mask applications—from large-area display masks to fine-pattern semiconductor masks.
Pegasus1416 is a high-throughput mask writer designed for large-size photomasks used in TFT-LCD and OLED display production.
Pegasus1416 is optimized for manufacturers requiring maximum productivity while maintaining consistent pattern quality across large substrates.
StarkR6 is a compact and reliable mask writer developed for second-layer and general photomask fabrication.
StarkR6 offers an ideal balance of accuracy, efficiency, and cost-effectiveness, making it suitable for stable production environments.
StarkSHR represents V-Technology’s next-generation platform for LSI and advanced semiconductor mask writing.
Development Focus
StarkSHR is designed to support future semiconductor technologies and evolving device nodes.
V-Technology Mask Writers
V-Technology Mask Writers provide a comprehensive and reliable solution for modern photomask manufacturing, supporting both current production demands and future technology development.
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