HTL Co. India Pvt. Ltd.

Semiconductor & Equipment Solutions

MICROTECH

Pattern Generator LW405

Precision in every pixel. Flexibility in every idea.

The smarter way to create micro-patterns

The MICROTECH Pattern Generator transforms the way you approach photolithography. Instead of relying on traditional photomasks and long lead times, it offers direct-write, mask-less lithography for rapid, high-resolution pattern generation.

Whether you’re prototyping micro-devices, developing photomasks, or running small-scale production, this system delivers the precision and adaptability modern research demands.

Fast, flexible, and cost-effective. it’s designed for innovators who want results without compromise.

Product Specifications

Key Features

  • High-resolution performance
    Achieve sub-micron line widths with superior accuracy and repeatability, ideal for advanced microfabrication and R&D applications.
  • Large-area capability
    Supports a wide range of exposure areas, from small research samples to large-format substrates; giving you flexibility for various project scales.
  • Direct writing versatility
    Write patterns directly onto planar or slightly curved substrates with consistent precision, even on challenging materials.
  • Comprehensive data compatibility
    Compatible with common CAD and layout formats like GDSII, DXF, and CIF, ensuring smooth integration into your existing workflow.
  • Advanced exposure control
    Multi-mode writing options, including beam-scan, stage-scan, and contour modes; enable fine-tuned control for complex or variable-depth structures.
  • Grey-level patterning
    Create grayscale or 3D exposure profiles with adjustable intensity levels for sophisticated optical and microstructural applications.
  • Low-maintenance design
    Modular components and a robust optical system minimize downtime and simplify servicing, keeping your focus on productivity.

Applications

The MICROTECH Pattern Generator is engineered for flexibility across a wide range of fields:

  • Photomask fabrication and repair
  • MEMS and microfluidic fabrication
  • Semiconductor and thin-film process development
  • Optical and diffractive element fabrication
  • Sensor and circuit trimming or repair
  • Advanced materials and nanostructure research
  • R&D environments requiring frequent design changes or rapid iteration.

Benefits to Your Workflow

  • Eliminate mask dependency: Go straight from design to exposure, no mask-making delays.
  • Accelerate innovation: Test, adjust, and perfect designs quickly with real-time control.
  • Cost-effective operation: Reduce material, mask, and maintenance costs significantly.
  • Adaptable for research and production: Suitable for both prototyping and low-volume manufacturing.
  • Reliable and consistent: Engineered for precision and long-term stability, ensuring repeatable results.
  • User-focused software: Intuitive interface for design import, parameter setup, and exposure control.

 

Catalog

  • Download the PDF below
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Technical Overview

Specification

Typical Performance

Minimum Line Width

Approximately 0.7 µm (depending on optics and configuration)

Writing Area

Configurable from small samples up to ~13 inches square

Writing Modes

Beam-scan, stage-scan, contour, vector, and flash

Supported Data Formats

GDSII, DXF, CIF, and other common CAD formats

Substrate Compatibility

Planar and slightly curved surfaces

Light Source

High-stability UV or visible laser, depending on model

System Design

Modular, low-maintenance, with precision mechanical alignment

Contact us to

Request a live demo or technical consultation

Get configuration and pricing details

Explore integration options for your process

sales@htlco.co.in

HTL Co. India Pvt. Ltd.

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