HTL Co. India Pvt. Ltd.

Semiconductor & Equipment Solutions

NIL Technology

CNI Series – Compact Nanoimprint Tool

Compact. Versatile. High-precision nanoimprinting

A new way to replicate micro- and nano-structures.

The CNI Series brings the power of nanoimprint lithography (NIL) into a desktop-sized system. Designed for research, prototyping, and small-scale production, it enables high-fidelity pattern transfer on various materials easily, affordably, and precisely.

Go from design to imprinted structure in minutes without the need for large cleanroom setups or complex lithography systems.

Product Specifications

Key Features

  • Compact Desktop Footprint
    The CNI’s small, fully self-contained design fits comfortably on any benchtop. Ideal for R&D labs, universities, and innovation centers that need professional nanoimprint capabilities without heavy infrastructure.
  • Thermal and UV Imprinting in One System
    Achieve both thermal imprinting (up to 250 °C) and UV imprinting (365 nm / 405 nm) in a single tool, supporting a wide range of materials and nanoimprint applications.
  • High-Fidelity Replication
    Reproduce micro- and nano-scale structures down to 100 nm, ensuring exceptional pattern accuracy, uniformity, and repeatability.
  • Easy, Intuitive Operation
    Simple controls and a user-friendly interface make setup, parameter tuning, and imprinting straightforward—even for first-time users.
  • Flexible Sample Compatibility
    Supports moulds and substrates up to 120 mm or 210 mm, including polymers, resists, glass, silicon, and other materials.
  • Cost-Effective & Lab-Ready
    A robust, plug-and-play platform requiring no external vibration isolation or air supply. Delivering high-performance nanoimprinting in a compact, affordable package.

Applications

The CNI Series is perfect for:

  • Nano-optics and diffractive elements (micro-lens arrays, meta-surfaces, gratings)
  • MEMS and microfluidic devices
  • Surface texturing and functional coatings
  • Wafer-level optics prototyping
  • Educational and research nanofabrication

Benefits to Your Workflow

  • High precision: Achieve detailed nano-patterns with reliable reproducibility.
  • Compact and portable: Desktop-friendly, minimal maintenance, no cleanroom dependency.
  • Flexible processing: Choose between UV /thermal imprint modes.
  • Quick setup: Start imprinting within minutes of powering on.
  • Affordable innovation: Professional nanoimprint capability at a fraction of traditional lithography costs.

 

Catalog

  • Download the PDF below
Download PDF

Technical Overview

Specification

Typical Value

Imprint Modes

Thermal (up to 250 °C) / UV (365 nm or 405 nm)

Substrate Size

Up to Ø120 mm or Ø210 mm

Minimum Feature Size

~100 nm

Supported Materials

Thermoplastics, UV resists, glass, silicon, polymers

Operation

Manual or semi-automated

System Size

Compact desktop configuration

Configuration Options

20+ variants for chamber, UV source, and control interface

Contact us to

Request a demo or sample imprint

Discuss your application needs

Get configuration and pricing details

sales@htlco.co.in

HTL Co. India Pvt. Ltd.

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