SPS POLOS HOTPLATES

Precision Thermal Processing Systems for Semiconductor & Microfabrication

The SPS POLOS Hotplate Series provides precise and uniform thermal processing for photoresist baking, polymer curing, annealing, and thin-film processing. Designed for semiconductor, MEMS, photolithography, microfluidics, and advanced materials applications, these compact table top systems deliver reliable temperature control and repeatable process performance for R&D and pilot-line environments.

Available in 200 mm and 300 mm substrate configurations, POLOS hotplates combine excellent temperature uniformity, programmable control, and cleanroom-compatible construction for demanding microfabrication workflows.

Product Specifications

Key Features

High-Uniformity Heating

Precision temperature control ensures consistent thermal processing across the entire substrate surface.

Benefits

Temperature uniformity up to ±1°C
Stable thermal performance
Reduced process variation
Improved batch repeatability

Programmable Process Control

Digital controllers support multi-step temperature profiles for repeatable baking and curing processes.

Advanced Process Options

Available configurations include:

Nitrogen (N₂) purge
Vacuum bake capability
Lifting pins
Proximity bake control
Hard contact or non-contact heating modes

Cleanroom-Compatible Design

Anodized aluminium heating surfaces and robust industrial construction provide long-term reliability in laboratory and cleanroom environments.

Compact & Cost-Effective

Space-saving table top design makes the system ideal for universities, research institutes, semiconductor labs, and pilot production facilities.

Applications

Photolithography Processing

Soft bake, hard bake, and post-exposure bake steps for photoresist processing.

Semiconductor & MEMS Fabrication

Reliable thermal processing for wafer-level manufacturing and microfabrication.

Polymer & Epoxy Curing

Controlled heating for polymers, adhesives, specialty materials, and thin films.

Research & Process Development

Ideal for universities, R&D laboratories, nanotechnology centres, and pilot production lines.

Why Choose SPS POLOS Hotplates?

Precise temperature control from 50–230°C
Uniform heating performance (±1°C)
Supports substrates up to 300 mm
Programmable process recipes
Optional vacuum and N₂ processing
Compact cleanroom-compatible design
Suitable for semiconductor and MEMS applications

Catalog

Product Range

Model	Version	Max Substrate Size	Temperature Range
POLOS-HP200ST Standard	Hotplate 200	Up to 200 mm	50–230°C
POLOS-HP200AD Advance	Hotplate 200	Up to 200 mm	50–230°C
POLOS-HP350AD Advance	Hotplate 350	Up to 300 mm	50–230°C

Common Specifications

Specification	Description
Temperature Range	50–230°C
Temperature Uniformity	±1°C
Material	Anodized Aluminium Heating Plate
Housing	Powder-Coated Steel
Power Supply	230 VAC
Control System	Digital Programmable Controller
Process Functions	Bake, Cure, Anneal

Contact us

Request technical specifications
Discuss thermal processing requirements
Compare available models
Schedule a product demonstration

HTL Co. India Pvt. Ltd.

Semiconductor & Equipment Solutions