CRS400S / CRS400S+ is a compact photomask repair system developed jointly by V Technology and HTL, designed for semiconductor middle/low-node applications and electronic components.
It provides stable and accurate repair of opaque and clear defects with high reliability in a space-efficient platform.
Optimized for efficiency, ease of use, and integration, CRS400S / S+ delivers professional-grade repair performance in a compact footprint.
CRS400S / CRS400S+ combines laser-based repair technology with uniquely developed optical systems to handle both large-area and minute defects efficiently. Its stable laser source, advanced imaging, and through-pellicle repair capability make it ideal for production environments seeking dependable performance with lower operational complexity.
The system supports a wide range of mask sizes and integrates seamlessly with existing inspection workflows.
ideal for:
Semiconductor photomask repair (middle / low nodes)
Electronic component photomasks
Opaque and clear defect correction
Cost-effective repair in production and R&D environments
Compact footprint: Efficient use of cleanroom space
Stable repair quality: Long-life laser and optimized optics
Flexible defect handling: Large-area and minute defects in one system
Lower operational complexity: Easy integration and operation
Proven collaboration: Jointly developed by V Technology & HTL
Specification | Typical Value |
Imprint Modes | Thermal (up to 250 °C) / UV (365 nm or 405 nm) |
Substrate Size | Up to Ø120 mm or Ø210 mm |
Minimum Feature Size | ~100 nm |
Supported Materials | Thermoplastics, UV resists, glass, silicon, polymers |
Operation | Manual or semi-automated |
System Size | Compact desktop configuration |
Configuration Options | 20+ variants for chamber, UV source, and control interface |
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