HTL Co. India Pvt. Ltd.

Semiconductor & Equipment Solutions

Draco - FIB Defect repair tool

High-Precision Defect Repair for Large-Size FPD Photomasks

Draco is the latest Focused Ion Beam (FIB) defect repair system designed for high-precision, large-size photomasks and halftone masks used in AM-OLED Flat Panel Display (FPD) manufacturing.
It delivers precise film thickness control and accurate pattern restoration, ensuring reliable defect repair even for advanced and complex mask designs.

With a compact footprint and reduced processing time, Draco provides efficient, high-quality repair performance for next-generation display production.

Product Specifications

Product Overview

Draco combines advanced FIB technology with an optimized differential vacuum system, significantly reducing equipment size and mask loading time. Its high-precision control capabilities enable accurate repair of fine and complex patterns, including OPC structures, while maintaining excellent process stability.

The system is optimized for large photomasks required in modern FPD and AM-OLED applications.

Specialty

  • The differential vacuum system reduces the footprint of the equipment.
  • Differential vacuum system reduces loading time.
  • High-precision film thickness control by FIB.
  • Perfect pattern copy function for fine and complex patterns such as OPC

Manufacturer

  • V-TECHNOLOGY

 

Supported Photomask Size

  • Photomask Size:G10
  • Customization: Available based on application requirements

Applications

ideal for:

  • FPD photomask defect repair

  • AM-OLED halftone mask repair

  • Advanced display manufacturing

  • High-precision mask rework and yield improvement

  • R&D and production repair environments

Benefits to Your Workflow

  • High repair accuracy: Precise FIB control for fine structures

  • Improved throughput: Reduced loading time

  • Compact footprint: Efficient use of cleanroom space

  • Pattern integrity: Accurate pattern copy for complex designs

  • Large mask support: Compatible with photomasks up to G10

Catalog

Technical Overview

Specification

Typical Value

Imprint Modes

Thermal (up to 250 °C) / UV (365 nm or 405 nm)

Substrate Size

Up to Ø120 mm or Ø210 mm

Minimum Feature Size

~100 nm

Supported Materials

Thermoplastics, UV resists, glass, silicon, polymers

Operation

Manual or semi-automated

System Size

Compact desktop configuration

Configuration Options

20+ variants for chamber, UV source, and control interface

Contact us to

Request a demo or sample imprint

Discuss your application needs

Get configuration and pricing details

HTL Co. India Pvt. Ltd.

Semiconductor & Equipment Solutions

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