Pictor2323 is an advanced Laser CVD (Chemical Vapor Deposition) repair system designed for semiconductor photomasks. It delivers stable, high-precision repair of opaque and clear defects, meeting the stringent accuracy requirements of advanced semiconductor manufacturing.
With uniquely developed optical systems and ultra-stable laser technology, Pictor2323 achieves 25 nm (3σ) repair accuracy with excellent edge quality, ensuring reliable defect correction for both large-area and fine-pattern defects.
Pictor2323 combines high-speed Laser CVD processing with nanometer-level positioning accuracy to provide consistent and repeatable photomask defect repair. Its dual-beam architecture enables efficient repair across a wide defect size range, while advanced imaging and pattern copy functions preserve original mask integrity.
Designed for seamless integration into semiconductor mask workflows, the system supports through-pellicle repair and compatibility with multiple inspection platforms.
ideal for:
Semiconductor photomask defect repair
Advanced logic and memory device masks
Opaque and clear defect correction
High-precision mask rework in production and R&D environments
Exceptional accuracy: 25 nm repair precision with high edge quality
Flexible defect handling: Large and minute defects in one system
High stability: Long-life laser sources and precision stage
Process efficiency: Through-pellicle repair capability
Easy integration: Compatible with multiple inspection platforms
Specification | Typical Value |
Imprint Modes | Thermal (up to 250 °C) / UV (365 nm or 405 nm) |
Substrate Size | Up to Ø120 mm or Ø210 mm |
Minimum Feature Size | ~100 nm |
Supported Materials | Thermoplastics, UV resists, glass, silicon, polymers |
Operation | Manual or semi-automated |
System Size | Compact desktop configuration |
Configuration Options | 20+ variants for chamber, UV source, and control interface |
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