Nano Imprint Lithography

NIL Technology ApS (NILT) specializes in Nano patterning and nanoimprint lithography. NILT has experience in meeting complex demands for research and new product development activities, and assists customers in all stages from pattern design to imprinted pattern. The NILT team consists of highly motivated and skilled engineers striving for delivering high quality one-stop solutions.

Silicon stamps/molds
Available sizes
  • Round: 2-inch, 4-inch round, 6-inch round, 8-inch round
  • Any square format cut from wafers.
Stamp thickness
  • In general the stamp thickness will follow the standard wafer thickness, i.e. 525 μm (2-inch and 4-inch), 675 μm (6-inch), and 725μm (8-inch)
  • We can prepare silicon stamps with features from below 20 nm
  • Structures with lateral size of below 20 nm to 300 nm will be patterned with EBL
  • Structures with lateral size of 300 nm to 2 μm will be patterned with DUV
  • Structures with lateral size larger than 2 μm will be patterned with UVL
Compact Nanoimprint (CNI)
Desktop nanoimprint tool. Easy replication of micro and nanoscale structures
  • Nanoimprint and hot embossing made simple
  • Easy and intuitive operation
  • Versatile usage
  • Plug-and-play
  • Designed for R&D

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